News & Events

2002

RIE-200iP, ICP Etching Systems at University of Delaware

Oct 7, 2002

Samco RIE-200iP (Chlorine-based Inductively Coupled Plasma) and Samco RIE-200iP (Fluorine-based Inductively Coupled Plasma) etching systems are being used at the University of Delaware's Electrical & Computer Engineering Department.

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