CVD Systems

PD-270STLC

Production Type PECVD System

The Samco PD-270STLC is a production type Plasma-Enhanced CVD system utilizing a liquid TEOS source to deposit SiO2 films at high speed using a low temperature process.
The strong sheath electrical field surrounding the cathode-coupled sample stage generates a high level of ion energy, which enables the deposition of silicon oxide films with low internal stress, from thin films to thick films (~30 μm).



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  • Features
  • Applications
  • Can process up to 220 mm wafers

  • High deposition rates (3000-5000 Å/min.)

  • Enables deposition on larges steps (200 μm) with high aspect ratios

  • SAMCO's liquid source TEOS deposition technology results in superior step-coverage and gap-fill performance

  • Low Particle Levels - A unique reaction chamber design minimizes the generation of particles within the reaction chamber

  • Control of Refractive Index - Germanium (Ge), Phosphorus, and Boron liquid source materials can be used to achieve control over the refractive index

  • Fully automatic "one-button" operation time with full manual override

  • High-speed deposition of thick silicon oxide films (up to 30 μm)

  • Fabrication of optical waveguides

  • Fabrication of etch masks for micromachining

  • Deposition of films on plastic surfaces

  • Low temperature deposition (from ambient to 300°C)

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