CVD Systems

PD-5400

Plasma-Enhanced CVD System
Samco's PD-5400 is a Plasma-Enhanced CVD system for mass production. Silicon oxide, silicon nitride and amorphous silicon films with excellent quality can be deposited with this system.

Dimensions:

Main Unit: 1600(W) x 1100(D) x 1800(H) mm


Options:

  • - Additional gas lines
  • - Turbo molecular pump
  • - Gas treatment unit

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  • Features
  • Applications
  • Sample size up to up to ⌀428 mm

  • Excellent thickness uniformity

  • Fully automatic operation

  • Complete set of safety interlocks

  • Compact design

  • Deposition of SiO2 films

  • Deposition of SiN films

  • Deposition of amorphous silicon (α-Si:H)

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