CVD Systems

PD-3800L

Plasma-Enhanced CVD System
Samco's PD-3800L is a load-lock Plasma-Enhanced CVD system designed for the deposition of silicon-based thin films with high throughput. The system is ideal for the deposition of high-quality silicon oxide, silicon nitride and amorphous silicon films.
The Samco PD-3800L is a load-lock version of the Model PD-3800 with a sample stage effective area of 350mm in diameter.

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  • Features
  • Applications
  • Load-lock type system

  • Fully automatic operation

  • High throughput

  • Large samples stage (350mm in diameter)

  • Deposition of silicon oxide (SiOx)

  • Deposition of silicon nitride (SiN)

  • Deposition of ceramic thin films

  • Deposition of amorphous silicon (α-Si:H)

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