CVD Systems

PD-2203L

Cluster type PECVD System
The Samco PD-2203L is a modular plasma-enhanced CVD system for pilot production applications. The system can be configured with up to 3 reaction chambers, which are installed around a centrally located load-lock chamber.
The PD-2203L is a cluster type CVD system, where each chamber can be used for a different plasma process. Samples are carried to a different chamber under vacuum through the load-lock chamber, where different processes can be carried out simultaneously, without exposing them to atmosphere.
The PD-2203L is ideal for sequential process using different process parameters and materials.

Dimensions:

Main Unit: 1613(W) x 2145(D) x 1799(H) mm


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  • Features
  • Applications
  • Up to 3 chambers can be installed around the load-lock chamber

  • Prevents cross contamination by carrying out different processes in separate chambers

  • Prevents contamination and oxidation caused by exposure to atmosphere when transferring between systems

  • Improves process throughput and efficiency

  • Lower system cost per chamber

  • Simple and compact system structure

  • Small footprint

  • Pilot production of LCDs

  • Passivation layer for organic EL (Electro Luminescence) devices

  • Deposition of amorphous silicon (α-Si:H) for solar cells

  • Deposition of silicon oxide (SiO2) films

  • Deposition of silicon nitride (Si3N4) films

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