Etching Systems

RIE-6000

Reactive Ion Etching System
Samco's RIE-6000 is a large batch type reactive ion etching system used to etch all types of semiconducting, insulating and metallic films.

Dimensions:

Main Unit: 1100(W) x 1720(D) x 2000(H) mm
Controller: 570(W) x 630(D) x 1843(H) mm
Pump unit: 400(W) x 760(D) x 906(H) mm

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  • Features
  • Applications
  • Large sample stage (600x600mm)

  • Easy to use computerized touch panel enables fully automatic operation of the system, as well as management of process parameters

  • Max. 5KW RF generator (water cooled)

  • Up to 4 mass flow controllers (MFC)

  • Equipped with compound turbo and backing dry pumps

  • Recipe storage and data logging

  • Superior anisotropic etching performance for silicon films used in ULSI devices

  • Etching of refractory metal films

  • Fabrication of light waveguides

  • Fabrication of micromachines

  • Manufacturing of various types of sensors

  • Processing of wafer level chip scale packages

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