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Micromachine processed by SAMCO Etching System


Details:

Liquid Source CVD (LS-CVD) system deposits Silicon Nitride (SiN) film on silicon substrate.
Joist structure was formed by combination of dry-etching and wet-etching.
[Photo by Dr. Itou, Fukushima Techonology Center]

Processed by SAMCO VPE-4F Etching System