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1979 September Samco International, Inc. was established
1980 July Released large CVD System for semiconductor process
1981 April Released Japan's first MOCVD system
1984 July Opened Tokyo branch office
1985 June

October
Moved HQ to current location.
Started to sell March Instrument (now Nordson) products
Opened Tokyo sales office
1987 February Opened OPTO Films Research Laboratory in Sunnyvale, California
1990 January
November
Opened Kanagawa office
Released LSCVD® system for processing of SiO2 film
1991 March
December
Opened Research and Development Center in Fushimi-ku, Kyoto
Opened second Production Facility in Fushimi-ku, Kyoto
1993 February
September
Opened Tsukuba office
Opened Tokai office
1994 February Released CVD system for ferroelectric film using the technology from Symmetric Corporation
1995 July
December
Developed CFC detoxifying technology
Released small etching system, the RIE-10NR
1996 December Released ICP etching system, the RIE-101iP
1997 January
January
Developed technology for DLC coating on PET bottles
Released ICP system, the RIE-200iP
1998 March
November
December
Opened Hiroshima office
Released mass production ICP system, the RIE-101iPC
Released CVD system, the PD-220
1999 July Acquired Service Department of Samco Engineering Inc
2000 January
May
Opened research laboratory in Cambridge University
Released mass production type plasma cleaning system, the PXA-200N
2001 May
July
October
Listed Samco's share on JSDA
Opened Taiwan office
Opened Sendai office
2003
November
December
Released mass production type CVD system, the PD-220LC
Introduced Bosch Process
2004 November
December

Opened Shanghai Office
Changed company name to Samco Inc.
Reduced the mandatory unit of transaction from 1,000 to 100
Moved Samco's shares from JSDA to JASDAQ
2005 February
May
Created Mass Production System Division
Released CVD system, the PD-2203L (ClusterLab)
2006 March
May
September
Created Product Support Center
Released Deep RIE system, the RIE-800iPB for MEMS
Signed on Collaboration Research with Tsinghua University of China
2007 November Released RIE-140iP/iPC for Laser Diode processing
2008 March
May
August
November
Opened the second Research and Development Center in Fushimi-ku, Kyoto
Released MOCVD system, MCV-2018
Opened South Korea office
Released Model RIE-330iPC
2009 January
April
October
Established Samco Global Service Inc. in Taiwan
Held 30th Anniversary party at Kyoto Hotel Okura
Released Deep RIE system, the RIE-400iPB for MEMS
2010 July

August
September
Released Plasma Enhanced CVD system, PD-330STC, designed for TSV mass production Released Plasma Enhanced CVD system, PD-5400, designed for LED mass production
Opened East Coast Office in North Carolina, US.(Moved to NJ in March 2017)
Opened Beijing office
2011 December Released ICP etching system, RIE-331iPC, designed for Asia markets.
2013 July Samco's stock listing was transferred to the Second Section of the Tokyo Stock Exchange market
2014 January
March
May
September
Transferred Samco's stock listing to the First Section of the Tokyo Stock Exchange
Signed distributor contract with Valence Process Equipment,Inc
Purchased 90% of the shares of UCP Processing Ltd.
Opened Fukuoka office
2015 September
December
Capital increased to 1,663,687 thousand JPY by newly issued stocks
Signed distributor contract with Epiluvac AB
Released Atomic Layer Deposition system, AL-1, designed for Electronic Devices
2016 June
August
Completed Second Promotion Center
Opened Malaysia office

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