Application

Laser Diode

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Manufacturing Flow Diagram

MOCVD

GaN-500

GaN Epitaxial
Growth

Laser Diode

Photolithography

Laser Diode

Dry Etching

RIE-400iP

Ridge Formation with EDP Monitoring

Laser Diode

Dry Cleaning

UV-300HC

Photo Resist
Removal

Laser Diode

Plasma-CVD

PD-220NL

PD-3800L

Passivation Film Deposition

Laser Diode

Dry Etching

RIE-400iP

Exposure of
p-Contact Layer
SiO2 Film Etching

Laser Diode

p-Electrode Formation by Sputtering

Creating p-electrode by sputtering Palladium (Pd) and Platinum (Pt)

Laser Diode

Substrate Polish

Polish away GaN substrate from the back side to be 100 µm thick

Laser Diode

Formation of n-Electrode

Sputter Titanium (Ti), Platinum (Pt), and Gold (Au) subsequently to create n-electrode

Laser Diode

Dicing

Cut the substrate into each chip

Laser Diode

Plasma-CVD

PD-220NL

PD-3800L

Reflecting Layer Formation

Deposit reflection layer on the edge of resonator

Laser Diode

Dry Cleaning

PC-1100

PXA-100

UV-300HC

Laser Diode Mount

Plasma cleaning before mounting Laser Diode chip and wire bonding

Laser Diode

Laser Diode

MEMS

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